Agenda
of the 16-th European OptiLayer Workshop
"Optical Coatings for Modern Applications"

Organized by Alexander Tikhonravov, Michael Trubetskov,
Irmgard Langbein, and Stephan Thelen

Workshop dates: March 19 - 21, 2012
Location: Laser Zentrum Hannover, Germany

Registration form can be downloaded here (MS Word format).

Hotel Information:
Havelser Hof: http://www.havelserhof.de
Mercure am Entenfang: http://www.hotel-am-entenfang.de
(Code word to get the reduced price: "workshop at Laser Zentrum"):

Monday, March 19

9:00 am	Opening remarks (Irmgard Langbein)
9:10	Basic principles and ideas of OptiLayer software (Alexander Tikhonravov)
9:55	Modern principles of software interface and presentation capabilities of OptiLayer software (Michael Trubetskov)
10:40	Coffee break
11:00	General purpose design techniques (Alexander Tikhonravov)
11:45	Thin film theory and its application in practical designing (Alexander Tikhonravov)
12:30	Lunch
13:30	Multiple solutions to design problems (Alexander Tikhonravov)
14:15	Design of WDM, narrow band pass, and minus filters (Alexander Tikhonravov)
15:00	Coffee break
15:20	Design of multilayers for ultra fast applications (Michael Trubetskov)
16:05	What’s new in OptiLayer software (Michael Trubetskov)
18:00	*Workshop reception (dinner will be provided)*

Tuesday, March 20

9:00 am	Design and properties of AR coatings (Tatiana Amotchkina)
9:45	Color analysis and design of coatings for color applications (Tatiana Amotchkina)
10:30	Coffee break
10:50	Analysis of practical multilayers. Influence of bulk inhomogeneity and surface roughness. (Alexander Tikhonravov)
11:35	Pre-production error analysis (Alexander Tikhonravov)
12:20	Lunch
13:30	Overview of monitoring techniques for optical coating production (Alexander Tikhonravov)
14:15	New trends in monitoring techniques (Alexander Tikhonravov)
15:00	Coffee break
15:20	Computational manufacturing as a tool for raising production yields (Alexander Tikhonravov)
16:05	Monitoring and control of deposition processes (Sebastian Schlichting)

Wednesday, March 21

9:00 am	Modeling of thin film growth (Markus Turowski)
9:45	Import of data to the programs of OptiLayer software family (Tatiana Amotchkina)
10:30	Coffee break
10:50	Optical characterization based on spectral photometric data (Alexander Tikhonravov)
11:35	Thin film characterization using spectral ellipsometric data (Tatiana Amotchkina)
12:20	Lunch
13:30	Optical properties of metal and island thin films (Tatiana Amotchkina)
14:15	Reverse engineering of optical coatings (Alexander Tikhonravov)
15:00	Coffee break
15:20	Integrating OptiLayer thin film software in the production environment (Michael Trubetskov)
16:05	Closing remarks (Irmgard Langbein)